DocumentCode :
1692822
Title :
Elimination of Freon and methylchloroform from the manufacturing process for hybrid microelectronic circuits
Author :
Simon, Alan J. ; Hines, Ken ; Caswell, Stephanie ; Rettger, Hank
Author_Institution :
Westinghouse, Baltimore, MD, USA
fYear :
1991
Firstpage :
284
Lastpage :
288
Abstract :
Recognizing the harmful effects of Freon and methylchloroform solvents on the environment, Westinghouse embarked on an extensive elimination/reduction program in connection with the manufacturing of hybrid microelectronic circuits. Experiments were performed in the following five key areas: thick film substrate fabrication, component attachment, substrate mounting, wirebonding, and package sealing. In each area, it was possible to eliminate or to find a suitable alternative to Freon and methylchloroform. The following recommendations are made: (1) Rosstech 119ME should be used for wet and dry thick film paste removal; (2) PF degreaser, acetone, and isopropyl alcohol should be used for removal of leak test grease: and (3) isopropyl alcohol and/or plasma cleaning should be used for all other cleaning operations
Keywords :
hybrid integrated circuits; integrated circuit manufacture; lead bonding; packaging; substrates; surface treatment; PF degreaser; Rosstech 119ME; Westinghouse; acetone; cleaning operations; component attachment; hybrid microelectronic circuits; isopropyl alcohol; manufacturing process; package sealing; plasma cleaning; solvents; substrate mounting; thick film substrate fabrication; wirebonding; Circuits; Cleaning; Fabrication; Manufacturing; Microelectronics; Packaging; Solvents; Substrates; Testing; Thick films;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Manufacturing Technology Symposium, 1991., Eleventh IEEE/CHMT International
Conference_Location :
San Francisco, CA
Print_ISBN :
0-7803-0155-2
Type :
conf
DOI :
10.1109/IEMT.1991.279797
Filename :
279797
Link To Document :
بازگشت