Title :
Effectiveness of the energy transport drift-diffusion model for submicrometer GaAs MESFETs
Author_Institution :
Dept. of Inf. Syst., Tokai Univ., Kanagawa, Japan
Abstract :
The energy transport drift-diffusion model is presented for submicron GaAs MESFETs, which accepts the physically-meaningful effective V-F characteristics depending on the distribution of the drift electric field or the drain voltage. They are evaluated using the 1D balance equations of momentum and energy. The drift velocity is described by a double-valued function of the drift electric field. This property is caused by the inertia motion of the Γ-valley electrons for the small drain voltage and by the hot electron effect for the large drain voltage. The present results well agree with the experimental and ensemble Monte Carlo simulation ones
Keywords :
III-V semiconductors; Schottky gate field effect transistors; electric fields; gallium arsenide; hot carriers; semiconductor device models; Γ-valley electrons; 1D balance equations; GaAs; V-F characteristics; drain voltage; drift electric field; energy transport drift-diffusion model; hot electron effect; submicron MESFETs; Charge carrier processes; Computational modeling; Electromagnetic compatibility; Electron mobility; Gallium arsenide; Kinetic energy; MESFETs; Monte Carlo methods; Poisson equations; Voltage;
Conference_Titel :
Microelectronics, 1995. Proceedings., 1995 20th International Conference on
Conference_Location :
Nis
Print_ISBN :
0-7803-2786-1
DOI :
10.1109/ICMEL.1995.500889