Title :
Relaxation mechanisms in 2D electron gas and origin of 1/f noise in HEMT´s
Author :
Mihaila, M. ; Heedt, C. ; Tegude, F.J.
Author_Institution :
ICCE, Bucharest, Romania
Abstract :
Experiments aiming at finding the microscopic origin of 1/f noise in HEMT´s are described. They were suggested by the existence of some specific energy relaxation mechanisms in a 2DEG. 1/f-like noise has been found in the drain voltage of lattice-matched InAlAs/InGaAs HEMT´s, at drain voltages(VDS) lower than 55 mV and applied gate voltage VGS=OV. The tendency for the drain voltage noise spectral density (Sv) is to follow a V2DS dependence, but local deviations manifest at some given voltages. These voltages seemed to be in a good correspondence with some specific phonon energies in the InAlAs/InGaAs system. These phonon signatures indicate that 1/f noise in the channel of InAlAs/InGaAs HEMT´s is brought about by lattice scattering. A mobility fluctuation 1/f noise parameter(α) of about 10-3 for the whole channel has been estimated. It stands for an indirect proof of lattice participation into the channel 1/f noise
Keywords :
1/f noise; III-V semiconductors; aluminium compounds; carrier mobility; carrier relaxation time; gallium arsenide; high electron mobility transistors; indium compounds; semiconductor device noise; 1/f noise; 2D electron gas; HEMTs; InAlAs-InGaAs; applied gate voltage; drain voltages; energy relaxation mechanisms; lattice scattering; lattice-matched devices; mobility fluctuation; noise spectral density; phonon energies; phonon signatures; Electrons; Fluctuations; HEMTs; Indium compounds; Indium gallium arsenide; Lattices; Microscopy; Phonons; Scattering; Voltage;
Conference_Titel :
Microelectronics, 1995. Proceedings., 1995 20th International Conference on
Conference_Location :
Nis
Print_ISBN :
0-7803-2786-1
DOI :
10.1109/ICMEL.1995.500908