Title :
Correlating Plasma Emissivity And Etch Depth*
Author :
Buie, M.J. ; Pender, J.T. ; Spindler, H.L. ; Soniker, J. ; Brake, M.L. ; Elta, M.
Author_Institution :
University of Michigan
Keywords :
Argon; Electrodes; Electrons; Etching; Inductors; Optical imaging; Optical recording; Plasma applications; Plasma materials processing; Plasma properties;
Conference_Titel :
Plasma Science, 1994. Conference Record - Abstracts., 1994 IEEE International Conference on
Conference_Location :
Santa Fe, NM, USA
Print_ISBN :
0-7803-2006-9
DOI :
10.1109/PLASMA.1994.589121
