Title :
Gas discharger generators of ultra-frequency a metal-bearing plasma to etching of piezoelectrics
Author :
Orlikov, L.N. ; Orlikov, N.L. ; Shandarov, S.M.
Author_Institution :
Dept. of Electron. Devices, State Univ. of Control Syst. & Radioelectron., Tomsk, Russia
fDate :
6/21/1905 12:00:00 AM
Abstract :
The etching of lithium niobate in a high-voltage glow discharge with voltage of 10 KV is discussed. Pulsed supply of metal vapors into the etching chamber causes the discharge resignation and the generation of high frequency oscillations. An inductive-capacitate composition in a discharge circuit generates frequency 5 MHz. This helps to remove discharge from the piezoelectric surface and to increase the etching speed to 5 mcm/h
Keywords :
lithium compounds; piezoelectric materials; plasma materials processing; sputter etching; 10 kV; 5 MHz; LiNbO3; discharge circuit; discharge resignation; etching chamber; etching speed; gas discharger generators; high frequency oscillations; high-voltage glow discharge; inductive-capacitate composition; metal vapors; metal-bearing plasma etching; piezoelectric surface; piezoelectrics; pulsed supply; ultra-frequency; Etching; Frequency; Lithium niobate; Plasma applications; Plasma devices; Plasma temperature; Space charge; Surface discharges; Thermal stresses; Voltage;
Conference_Titel :
High Power Microwave Electronics: Measurements, Identification, Applications, 1999. MIA-ME '99. Proceedings of the IEEE-Russia Conference
Conference_Location :
Novosibirsk
Print_ISBN :
5-7782-0270-9
DOI :
10.1109/MIAME.1999.827841
