DocumentCode
1698807
Title
High sensitive, miniaturized plano-convex quartz crystal microbalance fabricated by reactive ion etching and melting photoresist
Author
Li Li ; Abe, T. ; Esashi, M.
Author_Institution
Graduate Sch. of Eng., Tohoku Univ., Sendai, Japan
Volume
1
fYear
2003
Firstpage
508
Abstract
In this paper, high sensitive, miniaturized planoconvex quartz crystal microbalance (QCM) has been fabricated by reactive ion etching (RIE) and melting photoresist technology. Due to the convexity of the resonator surface and the small size of the excitation electrode, the energy of the oscillation is trapped at the center so that very little dissipation occurs at the edge. The fabricated plano-convex QCM has superior resonant characteristics compared with a QCM without the plano-convex formation. For example, the QCM with a high quality value (60000) was realized for a 1-mm-diameter electrode QCM with 1.6-/spl mu/m-deep and 2-mm-diameter convex formation on both sides. A spurious mode around a fundamental vibration mode was also suppressed less than 20% from that before the etching. This technology is useful from a viewpoint of mass production because it needs not polishing.
Keywords
melting; microbalances; photoresists; quartz; sensitivity; sputter etching; 1 mm; 1.6 micron; QCM; SiO/sub 2/; dissipation; electrode; etching; fundamental vibration mode; melting photoresist; miniaturized plano-convex quartz crystal microbalance; oscillation energy; reactive ion etching; resonant properties; resonator surface; sensitivity; Chemical technology; Crystallization; Dry etching; Electrodes; Fabrication; Isolation technology; Resists; Rough surfaces; Surface roughness; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
Conference_Location
Boston, MA, USA
Print_ISBN
0-7803-7731-1
Type
conf
DOI
10.1109/SENSOR.2003.1215365
Filename
1215365
Link To Document