• DocumentCode
    1700398
  • Title

    Analysis of piezoresistance in n-type 6H SiC for high-temperature mechanical sensors

  • Author

    Toriyama, T. ; Sugiyama, S.

  • Author_Institution
    Ritsumeikan Univ., Shiga, Japan
  • Volume
    1
  • fYear
    2003
  • Firstpage
    758
  • Abstract
    Piezoresistance in n-type 6H SiC was analyzed on the basis of electron transfer and mobility shift mechanisms for hexagonal many-valley semiconductors. Three important gauge factors for piezoresistive sensor application, i.e., the longitudinal-, transverse-and shear gauge-factors, were calculated by using band parameters. The calculation was compared with experimental results taken from the literature. It was shown that incorporation of the electron transfer and the mobility shift mechanisms gives reasonable interpretation for piezoresistance in n-type 6H SiC within temperature range from 300 K to 523 K, and impurity concentration at n=3.3/spl times/10/sup 19/ cm/sup -3./ These conditions correspond to typical operation ranges of high-temperature piezoresistive sensors.
  • Keywords
    Brillouin zones; electron mobility; impurity distribution; many-valley semiconductors; piezoresistance; silicon compounds; wide band gap semiconductors; 300 to 523 K; SiC; band parameters; electron transfer; hexagonal many-valley semiconductors; high-temperature mechanical sensors; impurity concentration; longitudinal gauge factors; mobility shift; piezoresistance; piezoresistive sensor; shear gauge factors; transverse gauge factors; Electron mobility; Impurities; Mechanical sensors; Piezoresistance; Scattering; Shape; Silicon carbide; Temperature distribution; Temperature sensors; Tensile stress;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
  • Conference_Location
    Boston, MA, USA
  • Print_ISBN
    0-7803-7731-1
  • Type

    conf

  • DOI
    10.1109/SENSOR.2003.1215584
  • Filename
    1215584