DocumentCode
1700398
Title
Analysis of piezoresistance in n-type 6H SiC for high-temperature mechanical sensors
Author
Toriyama, T. ; Sugiyama, S.
Author_Institution
Ritsumeikan Univ., Shiga, Japan
Volume
1
fYear
2003
Firstpage
758
Abstract
Piezoresistance in n-type 6H SiC was analyzed on the basis of electron transfer and mobility shift mechanisms for hexagonal many-valley semiconductors. Three important gauge factors for piezoresistive sensor application, i.e., the longitudinal-, transverse-and shear gauge-factors, were calculated by using band parameters. The calculation was compared with experimental results taken from the literature. It was shown that incorporation of the electron transfer and the mobility shift mechanisms gives reasonable interpretation for piezoresistance in n-type 6H SiC within temperature range from 300 K to 523 K, and impurity concentration at n=3.3/spl times/10/sup 19/ cm/sup -3./ These conditions correspond to typical operation ranges of high-temperature piezoresistive sensors.
Keywords
Brillouin zones; electron mobility; impurity distribution; many-valley semiconductors; piezoresistance; silicon compounds; wide band gap semiconductors; 300 to 523 K; SiC; band parameters; electron transfer; hexagonal many-valley semiconductors; high-temperature mechanical sensors; impurity concentration; longitudinal gauge factors; mobility shift; piezoresistance; piezoresistive sensor; shear gauge factors; transverse gauge factors; Electron mobility; Impurities; Mechanical sensors; Piezoresistance; Scattering; Shape; Silicon carbide; Temperature distribution; Temperature sensors; Tensile stress;
fLanguage
English
Publisher
ieee
Conference_Titel
TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
Conference_Location
Boston, MA, USA
Print_ISBN
0-7803-7731-1
Type
conf
DOI
10.1109/SENSOR.2003.1215584
Filename
1215584
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