DocumentCode :
1700398
Title :
Analysis of piezoresistance in n-type 6H SiC for high-temperature mechanical sensors
Author :
Toriyama, T. ; Sugiyama, S.
Author_Institution :
Ritsumeikan Univ., Shiga, Japan
Volume :
1
fYear :
2003
Firstpage :
758
Abstract :
Piezoresistance in n-type 6H SiC was analyzed on the basis of electron transfer and mobility shift mechanisms for hexagonal many-valley semiconductors. Three important gauge factors for piezoresistive sensor application, i.e., the longitudinal-, transverse-and shear gauge-factors, were calculated by using band parameters. The calculation was compared with experimental results taken from the literature. It was shown that incorporation of the electron transfer and the mobility shift mechanisms gives reasonable interpretation for piezoresistance in n-type 6H SiC within temperature range from 300 K to 523 K, and impurity concentration at n=3.3/spl times/10/sup 19/ cm/sup -3./ These conditions correspond to typical operation ranges of high-temperature piezoresistive sensors.
Keywords :
Brillouin zones; electron mobility; impurity distribution; many-valley semiconductors; piezoresistance; silicon compounds; wide band gap semiconductors; 300 to 523 K; SiC; band parameters; electron transfer; hexagonal many-valley semiconductors; high-temperature mechanical sensors; impurity concentration; longitudinal gauge factors; mobility shift; piezoresistance; piezoresistive sensor; shear gauge factors; transverse gauge factors; Electron mobility; Impurities; Mechanical sensors; Piezoresistance; Scattering; Shape; Silicon carbide; Temperature distribution; Temperature sensors; Tensile stress;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
TRANSDUCERS, Solid-State Sensors, Actuators and Microsystems, 12th International Conference on, 2003
Conference_Location :
Boston, MA, USA
Print_ISBN :
0-7803-7731-1
Type :
conf
DOI :
10.1109/SENSOR.2003.1215584
Filename :
1215584
Link To Document :
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