Title :
Colloidal self-organization for nanoelectronics
Author :
Dutta, Joydeep ; Sugunan, Abhilash
Author_Institution :
Sch. of Adv. Technol., Asian Inst. of Technol., Pathumthani, Thailand
Abstract :
The major part of the expenses in modern IC manufacturing process is nowadays devoted to the R & D needed to optimize chip size, wafer size, defectivity and interconnects- building up to keep Moore´s law a reality. But the question is: Can circuits with sub-0.1 μm dimensions be fabricated by the extension of current device production technologies? An interdisciplinary ´off the beaten path´ approach is mandatory to overcome future limitations. One such approach is fabrication of devices (or at least parts of devices) by self-organization.
Keywords :
colloids; integrated circuit manufacture; nanoelectronics; research and development; 0.1 micron; IC manufacturing; Moore law; chip size; colloidal self-organization; current device production; defectivity; interconnects-building; nanoelectronics; wafer size; Biosensors; CMOS process; CMOS technology; Manufacturing processes; Modems; Moore´s Law; Nanoelectronics; Nanotechnology; Research and development; Sensor phenomena and characterization;
Conference_Titel :
Semiconductor Electronics, 2004. ICSE 2004. IEEE International Conference on
Print_ISBN :
0-7803-8658-2
DOI :
10.1109/SMELEC.2004.1620822
