• DocumentCode
    1701632
  • Title

    Circuit aging prediction for low-power operation

  • Author

    Zheng, Rui ; Velamala, Jyothi ; Reddy, Vijay ; Balakrishnan, Varsha ; Mintarno, Evelyn ; Mitra, Subhasish ; Krishnan, Srikanth ; Cao, Yu

  • Author_Institution
    Dept. of Electr. Eng., Arizona State Univ., Tempe, AZ, USA
  • fYear
    2009
  • Firstpage
    427
  • Lastpage
    430
  • Abstract
    Low-power circuit operations, such as dynamic voltage scaling and the sleep mode, pose a unique challenge to aging prediction. Traditional aging models assume constant voltage and averaged activity factor, ignoring the impact of the long sleep period, and thus, result in a significant overestimation of the degradation rate. To accurately predict the aging effect in low-power design, this work first examines critical model assumptions in the reaction-diffusion process that is responsible for the NBTI effect. By using the correct diffusion profile, it then proposes a new aging model that effectively analyzes the degradation under various low-power operations. The new model well predicts the aging behavior of scaled CMOS measurement data (45 nm and 65 nm) with different operation patterns, especially sleep mode operation and dynamic voltage scaling. Compared to previous aging models, the new result captures the essential role of the long recovery phase in circuit aging, reducing unnecessary guardbanding in reliability protection.
  • Keywords
    CMOS integrated circuits; ageing; integrated circuit reliability; CMOS measurement data; channel hot carrier; circuit aging prediction; diffusion profile; dynamic voltage scaling; long sleep period; low-power circuit operations; low-power design; negative bias temperature instability; reaction-diffusion process; reliability protection; Aging; Circuit testing; Circuit topology; Delay; Frequency measurement; Inverters; MOS devices; Ring oscillators; Spatial resolution; Tiles;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Custom Integrated Circuits Conference, 2009. CICC '09. IEEE
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4244-4071-9
  • Electronic_ISBN
    978-1-4244-4073-3
  • Type

    conf

  • DOI
    10.1109/CICC.2009.5280814
  • Filename
    5280814