• DocumentCode
    1701880
  • Title

    Two-Dimensional Numerical Substrate Current Modeling For N-channel MOS Transistors

  • Author

    Meinerzhagen, B.

  • Author_Institution
    AT&T Bell Laboratories
  • fYear
    1987
  • Firstpage
    42
  • Lastpage
    59
  • Abstract
    This paper describes a 2D numerical simulation technique for impact ionization. Impact ionization is modeled by a ballistic form of Chynoweth´s formula [27] with an electron transport model including energy transport. Substrate currents resulting from impact ionization measured on devices in a 0.75 /spl mu/m CMOS technology, are compared with simulated results employing this model. The model shows good agreement with these measurements over a wide range of channel lengths and bias conditions.
  • Keywords
    CMOS technology; Current measurement; Electrons; Impact ionization; Length measurement; MOSFETs; Numerical models; Poisson equations; Semiconductor device modeling; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Numerical Analysis of Semiconductor Devices and Integrated Circuits, 1987. NASECODE V. Proceedings of the Fifth International Conference on the
  • Conference_Location
    Dublin, Ireland
  • Print_ISBN
    0-906783-72-0
  • Type

    conf

  • DOI
    10.1109/NASCOD.1987.721124
  • Filename
    721124