Title :
Application of Controllable Reactor in Suppressing the Voltage Fluctuation and Flicker under Hα Control Strategy
Author :
Zhou, L.X. ; Yin, Z.D. ; Lin, J.R. ; Hu, F.X.
Author_Institution :
Key Lab. of Power Syst. Protection & Dynamic Security Monitoring, North China Electr. Power Univ., Beijing
Abstract :
Voltage fluctuation and flicker are mainly caused by surge load with large capacity, which may lead to the unstable operation of the motor, the poor characteristics of electrical equipments and the mis-operation of the electronic device even damage etc. Traditional SVC can adjust the reactive power ideally to maintain the system voltage of the connection point and play an excellent role in suppressing the voltage fluctuation and flicker. The minor defect is that it can not be directly applied to the ultrahigh or extra-high voltage system. This paper puts forward a topology of SVC based on the controllable reactor. It can be made into voltage at any level to connect to the ultra-high or extra-high voltage network directly, and can dynamically adjust the saturation degree of the controllable reactor according to the fluctuation of the reactive power of the system, smoothly change the reactive power it sends out, effectively suppress the voltage fluctuation and flicker. Meanwhile, Halpha control is taker as the main control strategy. The validity of proposed approach is verified by calculation and simulation.
Keywords :
Hinfin control; fluctuations; reactive power control; surge protection; voltage control; Hinfin control strategy; controllable reactor; reactive power; topology; voltage flicker; voltage fluctuation; Automatic voltage control; Control systems; Inductors; Lamps; Power system control; Power systems; Reactive power control; Static VAr compensators; Voltage control; Voltage fluctuations; Electric arc furnace; Harmonic Suppression; H¿ control strategy; Magnetic valve controllable reactor; Voltage fluctuation and flicker;
Conference_Titel :
Power System Technology, 2006. PowerCon 2006. International Conference on
Conference_Location :
Chongqing
Print_ISBN :
1-4244-0110-0
Electronic_ISBN :
1-4244-0111-9
DOI :
10.1109/ICPST.2006.321853