DocumentCode :
1703223
Title :
Trimless second order curvature compensated bandgap reference using diffusion resistor
Author :
Kumar, Ajay
Author_Institution :
Texas Instrum., Dallas, TX, USA
fYear :
2009
Firstpage :
161
Lastpage :
164
Abstract :
A trim-less second order curvature compensated bandgap reference current using diffusion resistor is presented. An order of magnitude higher sheet-resistance (x50) and tighter process control of diffusion resistor than the poly has enabled this work to achieve the same current in one-third area. The process spread of diffusion resistor and VPNP transistor tracks each other, thereby resulting in higher accuracy without using any trim techniques. The proposed circuit is fabricated in a 0.5 mum CMOS process. The measured reference current has a variation of 46 ppm/degC over a temperature range of -55degC to 125degC.
Keywords :
CMOS integrated circuits; energy gap; process control; reference circuits; resistors; CMOS process; VPNP transistor; diffusion resistor; process control; sheet-resistance; size 0.5 mum; temperature -55 C to 125 C; trimless second order curvature compensated bandgap reference; CMOS process; Circuits; Current measurement; Photonic band gap; Process control; Resistors; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Custom Integrated Circuits Conference, 2009. CICC '09. IEEE
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4244-4071-9
Electronic_ISBN :
978-1-4244-4073-3
Type :
conf
DOI :
10.1109/CICC.2009.5280868
Filename :
5280868
Link To Document :
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