DocumentCode :
1703332
Title :
Electronic and optical applications of diamond-like carbon
Author :
Amaratunga, Gehan A J
Author_Institution :
Dept. of Eng., Cambridge Univ., UK
fYear :
1993
fDate :
11/4/1993 12:00:00 AM
Firstpage :
42583
Lastpage :
42584
Abstract :
In this contribution emphasis is placed on examining the electronic and optical properties of a-C and a-C:H in their own right as those belonging to an amorphous semiconductor. It is shown that the electronic density of states in semiconducting a-C and a-C:H is very different from that of other group IV amorphous semiconductors due to the presence of π states associated with sp2 hybridised bonds. Even in tetrahedral amorphous carbon (ta-C) with sp3 bonding of up to 70-80%, the π and π* states tend to determine the electronic and optical properties. Such π states are of course not present in diamond. This is in contrast to the mechanical properties of ta-C which can be very close to those of diamond. The presence of π bonding (in addition to the σ bonding) gives a-C and a-C:H some advantageous properties compared to a-Si and a-Ge. Passive use of a-C and a-C:H in applications such as IR windows and passivation layers and their potential for active use as electronic materials in optoelectronic devices are discussed. As examples of the latter, use of doped ta-C as a wide band-gap material with Si for heterojunctions and a-C:H in band-gap modulated amorphous superlattices are examined
Keywords :
amorphous semiconductors; carbon; electrical conductivity of amorphous semiconductors and insulators; electronic density of states; elemental semiconductors; energy gap; optoelectronic devices; semiconductor superlattices; semiconductor thin films; C; C:H; IR windows; amorphous semiconductor; band-gap modulated amorphous superlattices; diamond like C; electronic density of states; electronic materials; electronic properties; heterojunctions; ion beam deposition; mechanical properties; optical band gap; optical properties; optoelectronic devices; passivation layers; plasma deposited film; resistivity;
fLanguage :
English
Publisher :
iet
Conference_Titel :
Diamond in Electronics and Optics, IEE Colloquium on
Conference_Location :
London
Type :
conf
Filename :
280355
Link To Document :
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