• DocumentCode
    1705996
  • Title

    A 130.7mm2 2-layer 32Gb ReRAM memory device in 24nm technology

  • Author

    Tz-yi Liu ; Tian Hong Yan ; Scheuerlein, R. ; Yingchang Chen ; Lee, Jung Keun ; Balakrishnan, Ganesh ; Yee, G. ; Zhang, Haijun ; Yap, A. ; Ouyang, Jun ; Sasaki, T. ; Addepalli, Sateesh ; Al-Shamma, Ali ; Chin-Yu Chen ; Gupta, Madhu ; Hilton, Gene ; Joshi,

  • Author_Institution
    Sandisk, Milpitas, CA, USA
  • fYear
    2013
  • Firstpage
    210
  • Lastpage
    211
  • Abstract
    ReRAM has been considered as one of the potential technologies for the next-generation nonvolatile memory, given its fast access speed, high reliability, and multi-level capability. Multiple-layered architectures have been used for several megabit test-chips and memory macros [1-3]. This paper presents a MeOx-based 32Gb ReRAM test chip developed in 24nm technology.
  • Keywords
    integrated circuit reliability; random-access storage; MeOx-based ReRAM test chip; multiple-layered architectures; next-generation nonvolatile memory; reliability; size 24 nm; storage capacity 32 Gbit; two layer ReRAM memory device; Arrays; Charge pumps; Clocks; Leakage currents; Temperature sensors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Circuits Conference Digest of Technical Papers (ISSCC), 2013 IEEE International
  • Conference_Location
    San Francisco, CA
  • ISSN
    0193-6530
  • Print_ISBN
    978-1-4673-4515-6
  • Type

    conf

  • DOI
    10.1109/ISSCC.2013.6487703
  • Filename
    6487703