DocumentCode
1706348
Title
Cycling endurance optimization scheme for 1Mb STT-MRAM in 40nm technology
Author
Hung-Chang Yu ; Kai-Chun Lin ; Ku-Feng Lin ; Chin-Yi Huang ; Yu-Der Chih ; Tong-Chern Ong ; Chang, Joana ; Natarajan, Sriraam ; Tran, L.C.
Author_Institution
TSMC, Hsinchu, Taiwan
fYear
2013
Firstpage
224
Lastpage
225
Abstract
Spin-transfer-torque (STT) MRAM is considered as a good candidate for next-generation memory that can replace Flash, SRAM and DRAM as well. As a replacement of SRAM or DRAM, write endurance more than 1012 cycles is required. However, due to limitation in the reliability of magnetic tunnel junction (MTJ), the required endurance may not be achieved if the MTJ is overstressed by the write voltage. In this paper, a new write-path design with wire-resistance-balance scheme is presented that minimizes the voltage stress on MTJ during write operation for cells near the write buffer. Simulation shows the voltage across MTJ becomes more uniform for cells from top to bottom of array. This new scheme is implemented into 1Mb MRAM test-chip and is fabricated in TSMC 40nm low-power process. Cycling testing shows that write endurance can be improved as compared to the previous design.
Keywords
MRAM devices; low-power electronics; magnetic tunnelling; MRAM test-chip; MTJ; STT-MRAM; TSMC low-power process; cycling endurance optimization scheme; cycling testing; magnetic tunnel junction; next-generation memory; size 40 nm; spin-transfer-torque; voltage stress minimization; wire-resistance-balance scheme; write buffer; write-path design; Arrays; Current measurement; Magnetic tunneling; Random access memory; Resistance; Silicon; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference Digest of Technical Papers (ISSCC), 2013 IEEE International
Conference_Location
San Francisco, CA
ISSN
0193-6530
Print_ISBN
978-1-4673-4515-6
Type
conf
DOI
10.1109/ISSCC.2013.6487710
Filename
6487710
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