DocumentCode :
1707574
Title :
Irregularities in electronegative plasmas due to ion-ion coupling
Author :
Vitello, P.
Author_Institution :
Div. of Chem. Sci., Lawrence Livermore Nat. Lab., CA, USA
fYear :
1999
Firstpage :
100
Abstract :
Summary form only given. In partially ionized electronegative plasmas at low neutral pressure and high plasma density, coupling between positive and negative ions through space charge effects and through Coulomb scattering can lead to turbulence and irregularities in the ion density and flux. In this regime, the force on ions due to ion-ion Coulomb scattering may dominate that from ion scattering with neutrals. This can lead to the formation of a, possibly turbulent, negative ion boundary layer containing the bulk of the negative ions. Commercial Inductively Coupled Plasma reactors used in the semiconductor industry typically operate at low pressure and high plasma density. Simulations are presented for a Chlorine discharge in the GEC reactor modified for Inductively Coupled operation. Results show that ion-ion coupling can induce large variations in the plasma density, and that accurate modeling of spatial plasma structure should include these effects.
Keywords :
electronegativity; negative ions; plasma boundary layers; plasma density; plasma pressure; plasma simulation; plasma turbulence; space charge; Coulomb scattering; GEC reactor; chlorine discharge; inductively coupled operation; inductively coupled plasma reactors; ion density; ion flux; ion scattering; ion-ion Coulomb scattering; ion-ion coupling; irregularities; low pressure plasma; negative ions; neutral pressure; partially ionised electronegative plasmas; plasma density; plasma pressure; plasma turbulence; positive ions; semiconductor industry; simulations; space charge effects; spatial plasma structure modelling; turbulent negative ion boundary layer; Atomic layer deposition; Chemical vapor deposition; Heating; Inductors; Ionization; Magnetic flux; Plasma density; Plasma properties; Plasma temperature; Scattering;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5224-6
Type :
conf
DOI :
10.1109/PLASMA.1999.829300
Filename :
829300
Link To Document :
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