DocumentCode :
1707664
Title :
Space averaged kinetic analysis of stochastically heated electronegative RF capacitive discharges
Author :
Zuoding Wang ; Lichtenberg, A.J. ; Cohen, Ronald H.
Author_Institution :
California Univ., Berkeley, CA, USA
fYear :
1999
Firstpage :
101
Abstract :
Summary form only as given. In low pressure capacitive RF plasma discharges, stochastic sheath heating, combined with potentials that exclude low energy electrons from reaching the sheath, produce an electron energy probability function (EEPF) which approximates a two-temperature Maxwellian, as seen in both experiments and numerical simulations. We have used the fundamental kinetic equation to drive a space- and time-averaged kinetic equation to analytically calculate this EEPF. We improve over our model for stochastic heating by allowing the stochastic heating to be gradually turned on over a range of electron energy, instead of abruptly. A complete set of equilibrium conditions are used so that ail the unknown parameters can be solved self-consistently. The theory is applied to oxygen discharges, for which the equilibrium equations for the two ion species are coupled with the electron kinetic equation. The spatial diffusion profiles and the EEPF both agree well with PIC simulations.
Keywords :
high-frequency discharges; plasma heating; plasma kinetic theory; plasma pressure; plasma simulation; plasma transport processes; stochastic processes; PIC simulations; electron energy probability function; electron kinetic equation; equilibrium conditions; equilibrium equations; fundamental kinetic equation; ion species; low energy electrons; low pressure capacitive RF plasma discharges; particle in cell simulation; potentials; self-consistent solution; space averaged kinetic analysis; space-averaged kinetic equation; spatial diffusion profiles; stochastic heating; stochastic sheath heating; stochastically heated electronegative RF capacitive discharges; time-averaged kinetic equation; two-temperature Maxwellian; Electrons; Inductors; Kinetic theory; Magnetic fields; Plasma applications; Plasma density; Plasma simulation; Radio frequency; Space heating;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5224-6
Type :
conf
DOI :
10.1109/PLASMA.1999.829303
Filename :
829303
Link To Document :
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