DocumentCode :
1708675
Title :
Comparison of electron density measurements in planar inductively coupled plasmas by microwave interferometer and Langmuir probe
Author :
Guo, W. ; Wu, R.L.C. ; DeJoseph, C.A., Jr.
Author_Institution :
K Syst. Corp., Beavercreek, OH, USA
fYear :
1999
Firstpage :
126
Abstract :
Summary form only given, as follows. A Langmuir probe and a heterodyne microwave interferometer have been used to characterize a planar inductively coupled ion source operated in one of two configurations. In the normal configuration, moly extraction grids are used to form a beam of ions with energy over the range 50-500 eV. Alternately, the source is operated without grids resulting in a diffuse plasma which can be probed just outside the source. We have investigated probe tip orientations parallel and perpendicular to the plasma flow under both configurations. In the experiments, spatially resolved electron densities measured by Langmuir probe are fitted to a polynomial, spatially integrated, and compared with the line-integrated plasma density measured with the microwave interferometer. Results indicate that the two density measurements, extended over a broad range of input RF power, differ in the range of a few percent to approximately 30%. In addition to presenting measured data under various plasma conditions, the effects of probe tip orientation and other factors contributing to the total measurement errors are discussed.
Keywords :
Langmuir probes; electromagnetic wave interferometry; electron density; ion beams; ion sources; measurement errors; plasma density; plasma diagnostics; plasma flow; polynomials; 50 to 500 eV; Langmuir probe; density measurements; diffuse plasma; electron density measurements; heterodyne microwave interferometer; input RF power; ion beam; line-integrated plasma density; microwave interferometer; moly extraction grids; planar inductively coupled ion source; planar inductively coupled plasmas; plasma conditions; plasma flow; polynomial; probe tip orientation; probe tip orientations; spatially resolved electron densities; total measurement errors; Density measurement; Electrons; Energy resolution; Ion beams; Ion sources; Microwave measurements; Plasma density; Plasma measurements; Plasma sources; Probes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5224-6
Type :
conf
DOI :
10.1109/PLASMA.1999.829344
Filename :
829344
Link To Document :
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