Title :
Characteristics of titanium plasma for Ti vapor laser
Author :
Khedr, M.A. ; Sharkaway, H. ; El Sherbini, T.M.
Author_Institution :
Dept. of Phys., Cairo Univ., Giza, Egypt
Abstract :
Summary form only given. The application of direct laser vaporization is a useful technique to obtain a metal vapor in metal-vapor lasers, especially for high melting metals (Hirata et al., 1990). Characteristics of laser produced titanium plasma have been investigated using spectroscopic methods and CCD camera. The plasma was produced using pure Ti target irradiated with a pulsed switched Nd:YAG laser of 350 mJ/pulse at 1064 nm, pulse duration of 7 ns and repetition rate of 5 Hz. The electron temperature Te was found to be 8153 K with Ar background gas up to a pressure of 3 mbar. The electron density was found to be 1.4 10/sup 16/ cm/sup -3/ and increases with the Ar pressure up to 3 mbar. Two spectral lines at 551.4 nm and 625.8 nm were observed in the Ti spectra and were identified, corresponding to (3D01-3F2) and (3G04-3F3) transitions respectively.
Keywords :
ion lasers; plasma diagnostics; plasma pressure; plasma production by laser; plasma temperature; titanium; (3D01-3F2) transitions; (3G04-3F3) transitions; 1064 nm; 3 mbar; 5 Hz; 7 ns; 8153 K; Ar pressure; Ti; Ti vapor laser; direct laser vaporization; electron density; electron temperature; high melting metals; laser produced Ti plasma characteristics; metal vapor; optically pumped Ti vapor lasers; plasma pressure; pulse duration; pulse repetition rate; pulsed switched Nd:YAG laser; pure Ti target irradiation; spectral line intensities; spectroscopic methods; titanium plasma; Argon; Electrons; Gas lasers; Laser applications; Optical pulses; Plasma applications; Plasma properties; Plasma temperature; Spectroscopy; Titanium;
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5224-6
DOI :
10.1109/PLASMA.1999.829357
