Title :
Pulsed testing of a quasioptical gyrotron for materials processing
Author :
Fischer, R.P. ; Fliflet, Arne W.
Author_Institution :
Div. of Plasma Phys., Naval Res. Lab., Washington, DC, USA
Abstract :
Summary form only given. The quasioptical gyrotron (QOG) is under development at the Naval Research Laboratory as a high power source of millimeter-wave radiation. Recent experimental results include the production of up to 150 kW output power with 20% efficiency in 13 /spl mu/sec pulses. A new application of the QOG is the processing of ceramics and other non-metallic materials. High power millimeter-wave radiation offers unique capabilities for the application of coatings, sintering, brazing and soldering, and treatment of polymers. The new experiment is designed to produce 4 kW average power from 75-95 GHz using a 20 kV, 1.5 A DC electron beam. Initial pulsed testing has been performed at 20-60 kV cathode voltage, 0-6 A in 13 /spl mu/sec pulses. A pair of capacitive probes in the drift region are used to measure the average pitch ratio (/spl alpha/=/spl upsi//sub /spl perp////spl upsi//sub /spl par//) of the gyrating electron beam. The pitch ratio is varied by adjusting the magnetic field at the gun or the intermediate anode voltage. Measurements indicate that the average /spl alpha/ of the beam is less than simulation values for low cathode voltages.
Keywords :
brazing; ceramics; coatings; gyrotrons; millimetre wave generation; polymers; sintering; soldering; 0 to 6 A; 1.5 A; 150 kW; 20 to 60 kV; 4 kW; 55 kV; 75 to 95 GHz; DC electron beam; anode voltage; brazing; capacitive probes; ceramics; coatings; drift region; gyrating electron beam; initial pulsed testing; low cathode voltages; materials processing; millimeter-wave radiation; nonmetallic materials; polymers; pulsed testing; quasioptical gyrotron; sintering; soldering; Cathodes; Electron beams; Gyrotrons; Laboratories; Magnetic field measurement; Materials processing; Materials testing; Power generation; Production; Voltage;
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5224-6
DOI :
10.1109/PLASMA.1999.829392