• DocumentCode
    1709716
  • Title

    Microwave systems for the processing of advanced ceramics

  • Author

    Wilson, O. ; Carmel, Y. ; Lloyd, Ian ; Olorunyolemi, T. ; Calame, Jeffrey ; Gershon, D. ; Pert, E. ; Xu, Guoqing ; Walter, Michael ; Jaworski, Artur ; Birnboim, A.

  • Author_Institution
    Maryland Univ., College Park, MD, USA
  • fYear
    1999
  • Firstpage
    151
  • Abstract
    Summary form only given. A novel microwave processing system is being developed to study fundamental issues in the sintering of advanced ceramic materials with enhanced dielectric, thermal, optical, and mechanical properties for applications in microelectronics, biomaterials, and structural applications. The system consists of a single and dual frequency microwave furnace that operates at 2.45 and 28 GHz, an optical pyrometric temperature measuring system, and an optical, non-invasive, non-contact, extensometer for measuring sintering shrinkage and kinetics. The additional ability to process at 28 GHz provides opportunities to sinter a wider range of ceramic materials by direct coupling. An even more exciting benefit of the dual frequency system is the potential to process ceramics at two frequencies simultaneously. This capability can provide a unique way to tailor the microstructure of advanced ceramics by controlling the extent of both volumetric and surface heating. Experimental results for microwave sintering studies involving ZnO, hydroxyapatite, AlN-SiC composites and alumina composites will be presented, with an emphasis on the processing of nanograin ceramics. In particular, the role of surface modification and microwave field intensification effects will be discussed.
  • Keywords
    ceramics; furnaces; length measurement; microwave heating; shrinkage; sintering; temperature measurement; 2.45 GHz; 28 GHz; AlN-SiC composites; ZnO; advanced ceramic materials; alumina composites; biomaterials; hydroxyapatite; microelectronics; microwave furnace; microwave processing system; microwave sintering; optical noninvasive noncontact extensometer; optical pyrometric temperature measuring system; sintering; sintering shrinkage; structural applications; surface heating; volumetric heating; Biological materials; Biomedical optical imaging; Ceramics; Dielectric materials; Dielectric measurements; Electromagnetic heating; Frequency measurement; Mechanical factors; Microwave measurements; Optical materials;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
  • Conference_Location
    Monterey, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5224-6
  • Type

    conf

  • DOI
    10.1109/PLASMA.1999.829394
  • Filename
    829394