• DocumentCode
    1709792
  • Title

    Simulation of microwave sintering of ceramic bodies with complex geometry

  • Author

    Birnboim, A. ; Carmel, Y.

  • Author_Institution
    Inst. for Plasma Res., Maryland Univ., College Park, MD, USA
  • fYear
    1999
  • Firstpage
    152
  • Abstract
    Summary form only given. Microwave sintering is an emerging technology in which the energy is directly applied to the material enabling fast sintering with a potential for synthesis of advanced ceramic materials with superior properties. A dynamic balance between the rate of electromagnetic energy absorbed within the bulk of the sample and the rate of energy loss from its surface generally give rise to temperature gradients. These temperature gradients may be especially important during microwave sintering of bodies having a complex geometry since both the diffusion distance and the electromagnetic penetration depth do not scale with sample dimensions. The gradients generated in a zinc-oxide green body of a complex geometry were studied theoretically using various microwave sintering approaches. It was found that: (a) dual frequency (2.45 GHz and 30 GHz) microwave processing leads to reduction in the duration of the temperature gradients, and (b) an increase in the heating rate from 5/spl deg/C/min to 1400/spl deg/C/min at 2.45 GHz reduces the total required microwave energy by a factor of 55, while at the same time the internal temperature gradients are maintained over a substantially shorter time.
  • Keywords
    ceramics; microwave heating; sintering; 2.45 GHz; 30 GHz; advanced ceramic materials; ceramic bodies; complex geometry; dual frequency microwave processing; electromagnetic energy; electromagnetic penetration depth; heating rate; microwave sintering; temperature gradients; zinc-oxide green body; Ceramics; Educational institutions; Electromagnetic heating; Geometry; Microwave antenna arrays; Plasma properties; Plasma simulation; Plasma temperature; Process control; Solid modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
  • Conference_Location
    Monterey, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-5224-6
  • Type

    conf

  • DOI
    10.1109/PLASMA.1999.829397
  • Filename
    829397