DocumentCode
1709792
Title
Simulation of microwave sintering of ceramic bodies with complex geometry
Author
Birnboim, A. ; Carmel, Y.
Author_Institution
Inst. for Plasma Res., Maryland Univ., College Park, MD, USA
fYear
1999
Firstpage
152
Abstract
Summary form only given. Microwave sintering is an emerging technology in which the energy is directly applied to the material enabling fast sintering with a potential for synthesis of advanced ceramic materials with superior properties. A dynamic balance between the rate of electromagnetic energy absorbed within the bulk of the sample and the rate of energy loss from its surface generally give rise to temperature gradients. These temperature gradients may be especially important during microwave sintering of bodies having a complex geometry since both the diffusion distance and the electromagnetic penetration depth do not scale with sample dimensions. The gradients generated in a zinc-oxide green body of a complex geometry were studied theoretically using various microwave sintering approaches. It was found that: (a) dual frequency (2.45 GHz and 30 GHz) microwave processing leads to reduction in the duration of the temperature gradients, and (b) an increase in the heating rate from 5/spl deg/C/min to 1400/spl deg/C/min at 2.45 GHz reduces the total required microwave energy by a factor of 55, while at the same time the internal temperature gradients are maintained over a substantially shorter time.
Keywords
ceramics; microwave heating; sintering; 2.45 GHz; 30 GHz; advanced ceramic materials; ceramic bodies; complex geometry; dual frequency microwave processing; electromagnetic energy; electromagnetic penetration depth; heating rate; microwave sintering; temperature gradients; zinc-oxide green body; Ceramics; Educational institutions; Electromagnetic heating; Geometry; Microwave antenna arrays; Plasma properties; Plasma simulation; Plasma temperature; Process control; Solid modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829397
Filename
829397
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