A new test structure for interconnect capacitance monitoring

Author

Nouet, Pascal ; Toulouse, Alain

Author_Institution

Univ. des Sci. et Tech. du Languedoc, Montpellier, France

fYear

1997

Firstpage

81

Lastpage

84

Abstract

A new test structure for small capacitance measurement is proposed. Compared to previously presented test structures, the main advance concerns the DC output voltage that allows a more simple experimental set up. With such a test structure, the way is open for on-chip measurement of capacitances even for process monitoring. A validation test chip has been designed with test patterns dedicated to the accurate measurement of small interconnect capacitances

Keywords

capacitance measurement; integrated circuit interconnections; integrated circuit testing; monitoring; DC output voltage; interconnect capacitance monitoring; interconnect capacitances; onchip measurement; process monitoring; small capacitance measurement; test structure; validation test chip; Capacitance measurement; Circuit testing; Conducting materials; Delay; Integrated circuit interconnections; Integrated circuit measurements; Monitoring; Parasitic capacitance; Semiconductor device measurement; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Microelectronic Test Structures, 1997. ICMTS 1997. Proceedings. IEEE International Conference on

Conference_Location

Monterey, CA

Print_ISBN

0-7803-3243-1

Type

conf

DOI

10.1109/ICMTS.1997.589343

Filename

589343