DocumentCode
1710685
Title
Time evolution of ion energy distributions and optical emissions in pulsed radio frequency plasmas
Author
Misakian, M. ; Benck, E. ; Wang, Yannan ; Olthoff, James ; Roberts, John
Author_Institution
Nat. Inst. of Stand. & Technol., Gaithersburg, MD, USA
fYear
1999
Firstpage
173
Abstract
Summary form only given. Pulsed inductively coupled plasmas have recently received considerable attention because of their possible advantages over continuous plasma discharges in industrial applications. We report the results of time-resolved measurements of ion energy distributions, relative ion densities, as well as optical emissions and electrical characteristics in such plasmas for the simple gas mixture of argon and oxygen (50% Ar/50% O/sub 2/). Comparisons with pure argon are also presented. An inductively coupled version of the Gaseous Electronics Conference RF reference cell is used to produce the pulsed plasmas and the ions are sampled though a 10 /spl mu/m diameter hole in the center of a grounded plate electrode. Ions exiting through the hole are characterized with a 45/spl deg/ electrostatic energy analyzer connected in series with a quadrupole mass spectrometer. Optical emission measurements have been made at several different wavelengths to monitor the time evolution of excited species of argon and oxygen.
Keywords
discharges (electric); mass spectra; plasma diagnostics; Ar; Ar-O/sub 2/; Ar-O/sub 2/ gas mixture; Gaseous Electronics Conference RF reference cell; O/sub 2/; electrical characteristics; electrostatic energy analyzer; excited species; grounded plate electrode; ion energy distributions; ion sampling; optical emission measurements; optical emissions; pulsed radio frequency plasmas; quadrupole mass spectrometer; relative ion densities; time evolution; time-resolved measurements; Argon; Density measurement; Energy measurement; Optical pulses; Particle beam optics; Plasma applications; Plasma density; Plasma measurements; Plasma properties; Stimulated emission;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829441
Filename
829441
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