DocumentCode :
1710949
Title :
Plasma suppression and spot size stabilization in single and multiple pulse flash X-ray radiography
Author :
Kwan, T.J.T. ; Snell, C.M.
Author_Institution :
Los Alamos Nat. Lab., NM, USA
fYear :
1999
Firstpage :
181
Abstract :
Summary form only given. Next generation X-ray radiography machines must use high electron beam current to provide the necessary dose and very small spot size to achieve the desired optical resolution. However, this combination of high current in a small area leads to undesirable side effects that were not important in old machines. Specifically, the intense local energy deposition from the high intensity electron beam causes vaporization of the bremsstrahlung target. The hot plasma thus generated provides a copious source of positive ions that are rapidly accelerated into the negative potential well of the incoming electron beam. As the ions propagate upstream, they partially charge neutralize the electron beam, causing its spot size to increase. We have studied the electron beam spot stabilization for the Dual Axis Radiographic Hydrotest Facility (DARHT).
Keywords :
X-ray apparatus; bremsstrahlung; plasma production; radiography; vaporisation; Dual Axis Radiographic Hydrotest Facility; bias potential; bremsstrahlung target; charge neutralisation; electron beam; electron beam current; energy degradation; high intensity electron beam; intense local energy deposition; ion trap; mechanical barrier; multiple pulse flash X-ray radiography; negative potential well; optical resolution; plasma plume; plasma suppression; positive ions; self-bias target; side effects; single pulse flash X-ray radiography; spot size; spot size stabilization; vaporization; Electron accelerators; Electron beams; Laboratories; Plasma accelerators; Plasma confinement; Plasma materials processing; Plasma stability; Plasma temperature; Plasma x-ray sources; Radiography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5224-6
Type :
conf
DOI :
10.1109/PLASMA.1999.829452
Filename :
829452
Link To Document :
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