DocumentCode
1711769
Title
A laser-produced plasma sustained by a radiofrequency source
Author
Kelly, K.L. ; Scharer, J.E. ; Ding, G.
Author_Institution
Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA
fYear
1999
Firstpage
199
Abstract
Summary form only given, as follows. The creation a high density plasma in atmospheric air is studied. The plasma is generated by photoionization of the organic seed molecule tetrakis(dimethylamino)ethylene (TMAE) and is sustained by RF coupling through the use of an antenna. The coupled power is a function of antenna configuration, plasma density, working gas: and applied magnetic field. Previous studies have utilized these antennas to couple power to the plasma through the inductive mode of operation. The inductive source operates by coupling power to the plasma through collisional ohmic heating of the wave energy. Helicons have shown to be very efficient sources in the low pressure argon regime with densities of the order 4/spl times/10/sup 13/ cm/sup -3/ with only 600 W of power in a 5 cm radius tube. The VUV laser in this experimental has created plasmas of order 10/sup 14/ cm/sup -3/. The high density gives an initial condition which allows higher radiation resistance and more power to couple to the plasma. The computer codes ANTENA2 and MAXEB are used to optimize the experiment and interpret results. The effects of adding separate air constituents will be studies as a function of neutral pressure, and will be compared to the effects of adding inert gases. Both highly collisional power absorption and noncollisional Landau effects will be investigated.
Keywords
organic compounds; photoionisation; plasma density; plasma production by laser; 600 W; ANTENA2 computer code; Ar; MAXEB computer code; RF coupling; antenna configuration; applied magnetic field; atmospheric air; collisional ohmic heating; collisional power absorption Landau effects; helicons; high density plasma; inert gases; laser-produced plasma; noncollisional Landau effects; organic seed molecule; photoionization; plasma density; radiation resistance; radiofrequency source; tetrakis(dimethylamino)ethylene; Argon; Couplings; Gases; Heating; Ionization; Magnetic fields; Plasma density; Plasma sources; Plasma waves; Radio frequency;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829485
Filename
829485
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