DocumentCode :
1712742
Title :
The effect of carbonaceous deposit for NO/sub x/ dissociation by barrier discharge
Author :
Fujiwara, Koji ; Itoyama, Katsutoshi ; Yanobe, T.
Author_Institution :
Fac. of Educ., Nagasaki Univ., Japan
fYear :
1999
Firstpage :
217
Abstract :
Summary form only given. A carbonaceous deposit was formed on the dielectric and the surface of electrodes, when the barrier discharge is generated in the mixed gas of CH/sub 4/ and N/sub 2/+NO. The authors have done this pre-treatment, changing the ratio of CH/sub 4/ and N/sub 2/+NO gases from 60 to 80%, under the condition of 500 to 700 Torr in pressure. After this pre-treatment was carried out, we introduced N/sub 2/+NO gas into the chamber. NO/sub x/ dissociation was done with 700 Torr of pressure in the chamber and 300 ml/min of flow rate. The authors investigated the effect of carbonaceous deposit and barrier discharge for NO/sub x/ dissociation. We measured mass spectra on NO/sub x/ by Q-mass. The dielectric is hard glass of 0.15 mm in thickness. The length of gap is 0.8 mm. An applied potential between electrodes was about 4,000 volts AC (peak value) and its frequency was 4.7 kHz.
Keywords :
dissociation; mass spectra; nitrogen compounds; plasma chemistry; plasma diagnostics; plasma-wall interactions; 4.7 kHz; 4000 V; 500 to 700 torr; N/sub 2/-NO; N/sub 2/-NO mixture; N/sub 2/O; NO; NO/sub 2/; NO/sub x/; NO/sub x/ dissociation; applied potential; barrier discharge; carbonaceous deposit; dielectric; electrode surface; flow rate; mass spectra; methane; mixed gas; pre-treatment; Argon; Dielectric measurements; Electrodes; Furnaces; Heating; Iron; Plasma materials processing; Plasma measurements; Plasma sources; Surface discharges;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5224-6
Type :
conf
DOI :
10.1109/PLASMA.1999.829521
Filename :
829521
Link To Document :
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