DocumentCode :
1712787
Title :
Large-Area Plasma Processing System
Author :
Fernsler, R. ; Manheimer ; Meger, R.A. ; Murphy, D.P. ; Leonhardt, Darin ; Pechacek, R.E. ; Walton, S.G. ; Lampe, M.
Author_Institution :
Div. of Plasma Phys., Naval Res. Lab., Washington, DC, USA
fYear :
1999
Firstpage :
220
Abstract :
Summary form only given. The Naval Research Laboratory has developed a new type of plasma processing reactor called the Large-Area Plasma Processing System (LAPPS). This device uses a magnetically confined, sheet electron beam to produce planar plasmas with densities up to 5/spl times/10/sup 22/ cm/sup -3/, area /spl sim/1 m/sup 2/, and thickness /spl sim/1 cm. Other LAPPS attributes include: high uniformity; operation over a wide range of gas type and pressure; independent control of the ionization rate; efficient production of ions and free radicals; low metastable density; modest gas heating; a low and partially adjustable electron temperature; and independent bias control. Disadvantages of LAPPS include: the need for an energetic electron beam (a few keV and 10´s mA/cm/sup 2/); the need for a longitudinal magnetic field (/spl sim/200 G) to confine the beam; cross-field restrictions on the plasma now; beam-plasma instabilities; and energy losses to the beam dump. This talk will present the theory underlying LAPPS.
Keywords :
plasma beam injection heating; plasma density; plasma instability; plasma materials processing; plasma temperature; plasma-beam interactions; 1 cm; 200 G; Large-Area Plasma Processing System; adjustable electron temperature; beam-plasma instabilities; bias control; energy losses; gas heating; ionization rate; low metastable density; magnetically confined sheet electron beam; planar plasmas; plasma processing reactor; Electron beams; Magnetic confinement; Particle beams; Plasma confinement; Plasma density; Plasma devices; Plasma materials processing; Plasma temperature; Pressure control; Temperature control;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5224-6
Type :
conf
DOI :
10.1109/PLASMA.1999.829523
Filename :
829523
Link To Document :
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