DocumentCode :
1712949
Title :
Hydrogen and hydrogen-argon discharge measurements and models of a compact microwave ECR plasma source
Author :
Tsai, M.-H. ; Grotjohn, Timothy A.
Author_Institution :
Dept. of Electr. & Comput. Eng., Michigan State Univ., East Lansing, MI, USA
fYear :
1999
Firstpage :
223
Abstract :
Summary form only given. Hydrogen discharges and hydrogen-argon discharges are created and studied in a compact microwave ECR plasma source operating in the 0.4-5 mTorr pressure range. The source [1] has a discharge region of 3.6 cm in diameter and an excitation volume of 50 cm/sup 3/. The plasma species diffuse out of the source into a larger materials processing region. The discharge is excited at a frequency of 2.45 GHz with input power levels of 50-90 watts. Measurements of the ion density, electron temperature, and absolute atomic hydrogen concentration are performed using Langmuir probes, OES and actinometry. Measurements are performed in both the source/excitation region and in the downstream processing region. A global model for the discharges in this plasma source and a downstream charge particle diffusion model are also developed. The features of these plasma discharges determined by the combined measurements and models include a source region ion density in the 10/sup 11/ cm/sup -3/ range, which corresponds to an ionization ratio of 0.001 to 0.01.
Keywords :
Langmuir probes; chemical analysis; microwave devices; plasma diagnostics; plasma pressure; plasma production; plasma simulation; plasma temperature; radiometry; 0.4 to 5 mtorr; 2.45 GHz; 5 to 14 eV; 50 to 90 W; H/sub 2/; H/sub 2/-Ar; H/sub 2//sup +/; Langmuir probes; absolute atomic hydrogen concentration; compact microwave ECR plasma source; discharge; discharge region; downstream charge particle diffusion model; downstream processing region; electron heating enhancement; electron temperature; global model; hydrogen discharge measurements; hydrogen-argon discharge measurements; input power levels; ion density; ionization ratio; magnetic confinement; materials processing; plasma discharges; plasma simulation; plasma source; plasma species; pressure range; source region ion density; source/excitation region; surface recombination coefficient; two-dimensional self-consistent microwave field; Atomic measurements; Density measurement; Fault location; Hydrogen; Performance evaluation; Plasma density; Plasma materials processing; Plasma measurements; Plasma sources; Plasma temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5224-6
Type :
conf
DOI :
10.1109/PLASMA.1999.829529
Filename :
829529
Link To Document :
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