Title :
Influence of the microwave magnetic field on high power microwave window breakdown
Author :
Hemmert, D. ; Neuber, A. ; Dickens, J. ; Krompholz, H. ; Hatfield, L.L. ; Kristiansen, M.
Author_Institution :
Dept. of Electr. Eng., Texas Tech. Univ., Lubbock, TX, USA
Abstract :
Summary form only given. Effects of the microwave magnetic field on window breakdown are investigated at the upstream and downstream side of a dielectric interface. Simple trajectory calculations of secondary electrons in an RF field show significant forward motion of electrons parallel to the microwave direction of propagation. The Lorentz-force due to the microwave magnetic field on high-energy secondary electrons might substantially influence the standard multipactor mechanism. As a result, the breakdown power level for the downstream side of a window would be higher than for the upstream side. This hypothesis was tested utilizing an S-band traveling wave resonant ring, powered by a 3 MW magnetron at 2.85 GHz, leading to a total power greater than 60 MW. Breakdown was studied on an interface geometry consisting of a thin alumina slab in the waveguide, oriented normal to the microwave propagation direction.
Keywords :
UHF tubes; electric breakdown; magnetic field effects; microwave propagation; travelling wave tubes; 2.85 GHz; 3 MW; 60 MW; RF field; S-band traveling wave resonant ring; X-ray imaging; breakdown power level; dielectric interface; distributed X-ray source; downstream side; field enhancement tips; forward motion; high power microwave window breakdown; high speed imaging; high-energy secondary electrons; interface geometry; local field probes; magnetron; microwave Lorentz force; microwave direction of propagation; microwave magnetic field; power probes; secondary electrons; standard multipactor mechanism; thin alumina slab; upstream side; Dielectric breakdown; Electric breakdown; Electrons; Geometry; Magnetic resonance; Microwave magnetics; Microwave propagation; Radio frequency; Slabs; Testing;
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5224-6
DOI :
10.1109/PLASMA.1999.829539
