DocumentCode :
1713575
Title :
Electron angular distribution in an opening-switch-driven coaxial diode
Author :
Harper-Slaboszewicz, Victor J. ; Martinez, Carlos
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM, USA
fYear :
1999
Firstpage :
236
Abstract :
Summary form only given. Characterization of the angular distribution of electrons produced in a coaxial high-current relativistic electron beam diode may be important in evaluating the applications of these diodes. This angular distribution has not previously been measured for an opening-switch-driven low impedance coaxial diode. Because the opening switch may have plasma in the vicinity of the diode, it is expected that the angular distribution may differ from that found in a closing-switch driven system. On the DECADE Module I, the distribution was measured using a multiple-aperture shadowbox imaging system, using radiochromic film to record the distribution. Nominal DM1 electron beam parameters are 1.7 MV peak voltage, 700 kA peak current, and 40 ns FWHM produced with a 6 inch diameter cathode. Twenty-one 0.332 cm diameter apertures on a grid pattern with a center-to-center spacing of 4.45 cm are distributed over the the central 8 inch diameter of the anode.
Keywords :
plasma diagnostics; plasma diodes; plasma flow; plasma switches; 1.7 MV; 40 ns; 6 inch; 700 kA; 8 inch; DECADE Module I; angular distribution; apertures; cathode; center-to-center spacing; coaxial high-current relativistic electron beam diode; distribution measurement; electron angular distribution; electron beam parameters; grid pattern; multiple-aperture shadowbox imaging system; opening-switch-driven coaxial diode; opening-switch-driven low impedance coaxial diode; peak current; peak voltage; radiochromic film; Apertures; Cathodes; Coaxial components; Diodes; Electron beams; Impedance measurement; Plasma applications; Plasma measurements; Switches; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5224-6
Type :
conf
DOI :
10.1109/PLASMA.1999.829552
Filename :
829552
Link To Document :
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