DocumentCode
1713916
Title
Simulation of magnetron sputter with three-dimensional magnetic field
Author
Shon, C.H. ; Park, Joon S. ; Lee, Jung Keun
Author_Institution
Dept. of Phys., Pohang Univ. of Sci. & Technol., South Korea
fYear
1999
Firstpage
243
Abstract
Summary form only given. Various properties of planar magnetron system are obtained with a kinetic code (Verboncoeur et al., 1995) in a magnetic field in two dimension and three dimension. We simulate the magnetron system to obtain various plasma characteristics and erosion profiles of target material with these magnetic fields. The steady-state properties are calculated from the scaling formulas to save computing time. Various geometries and magnetic fields are used to optimize the erosion profiles and plasma characteristics. The calculated erosion profile is compared with experimental one. The maximum erosion point of calculation coincides well with the experimental one. The discrepancy of erosion width between calculation and experiment originates from the changes of electric field and magnetic field in the eroded target region. This is verified from the simulation with a pre-eroded target geometry.
Keywords
electrodes; magnetic field effects; magnetrons; plasma simulation; sputtering; wear; electric field; eroded target region; erosion profiles; erosion width; geometries; kinetic code; magnetron sputter; planar magnetron system; plasma characteristics; pre-eroded target geometry; steady-state properties; three-dimensional magnetic field; Computational modeling; Geometry; Kinetic theory; Magnetic fields; Magnetic materials; Magnetic properties; Plasma materials processing; Plasma properties; Plasma simulation; Steady-state;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829565
Filename
829565
Link To Document