Title :
High power microwave generation using a repetitive electron gun with a ferroelectric cathode
Author :
Hayashi, Yasuhiro ; Ivers, J.D. ; Nation, J.A. ; Wang, Peng ; Golkowski, Czeslaw ; Flechtner, D. ; Schachter, Levi
Author_Institution :
Sch. of Electr. Eng., Cornell Univ., Ithaca, NY, USA
Abstract :
Summary form only given. An electron gun using a ferroelectric cathode driven by a ferrite core transformer-pulse line system produces a 500 kV, 50-200 A 250 ns long beam. The beam is used to drive an X-band amplifier. The amplifier consists of a single stage disk loaded type structure. At the end of the amplifier, a coaxial mode converter is used to decouple the beam from the microwave radiation. The amplifier operates at a repetition rate of 0.1 Hz. The beam emission is controlled by a voltage pulse applied to the back of the ferroelectric. Results will be reported on the amplifier performance characteristics with a 50 A beam and the results compared with simulation data. An improved gun design, which gives a uniform cross section 200 A beam is being built, and early results obtained using the high current gun will also be presented.
Keywords :
cathodes; electron guns; ferroelectric devices; microwave amplifiers; microwave generation; 250 ns; 50 to 200 A; 500 kV; X-band amplifier; amplifier operation; amplifier performance; amplifier repetition rate; beam decoupler; beam emission; coaxial mode converter; ferrite core transformer-pulse line system; ferroelectric cathode; gun design; high current gun; high power microwave generation; microwave radiation; repetitive electron gun; single stage disk loaded type structure; voltage pulse; Cathodes; Coaxial components; Electron beams; Ferrites; Ferroelectric materials; High power microwave generation; Microwave amplifiers; Pulse amplifiers; Transformer cores; Voltage control;
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5224-6
DOI :
10.1109/PLASMA.1999.829569