DocumentCode
1714032
Title
High power Ka band TWT amplifier
Author
Golkowski, C. ; Ivers, J.D. ; Nation, J.A. ; Wang, P. ; Schachter, L.
Author_Institution
Sch. of Electr. Eng., Cornell Univ., Ithaca, NY, USA
fYear
1999
Firstpage
246
Abstract
Summary form only given. Two high power 35 GHz TWT amplifiers driven by a relativistic pencil 850 kV, 200 A electron beam have been assembled and tested. The first had a dielectric slow wave structure and was primarily used to develop diagnostics, and to gain experience in working with high power systems in Ka band. The source of the input power for the amplifier was a magnetron producing a 40 kW, 200 ns long pulse of which 10 kW was delivered to the experiment. The 30 cm long dielectric (Teflon) amplifier produced output power levels of about 1 MW with a gain of about 23 dB. These results are consistent with expectations from PIC code simulations for this arrangement. The second amplifier, which is a single stage disk loaded slow wave structure, has been designed. It consists of one hundred uniform cells with two sets of ten tapered cells at the ends to lower the reflection coefficient. The phase advance per cell is /spl pi//2. The amplifier passband extends from 28 to 40 GHz. It is designed to increase the output power to about 20 MW. The amplifier is in construction and will be tested in the near future. Details of the design of both systems will be provided and initial results from the new amplifier presented.
Keywords
digital simulation; power systems; radiofrequency amplifiers; travelling wave amplifiers; 1 MW; 10 kW; 20 MW; 200 A; 200 ns; 28 to 40 GHz; 30 cm; 35 GHz; 40 dB; 40 kW; 850 kV; Ka band; PIC code simulations; Teflon amplifier; amplifier passband; diagnostics; dielectric amplifier; dielectric slow wave structure; high power Ka band TWT amplifier; high power systems; input power source; magnetron; output power levels; phase advance; reflection coefficient; relativistic pencil electron beam; single stage disk loaded slow wave structure; tapered cells; uniform cells; Assembly; Dielectrics; Electron beams; High power amplifiers; Optical reflection; Power amplifiers; Power generation; Pulse amplifiers; Pulse power systems; Testing;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829570
Filename
829570
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