DocumentCode :
1714063
Title :
Microhollow cathode discharge excimer light sources
Author :
El-Habachi, A. ; Moselhy, Mohamed ; El-Dakroury, A. ; Schoenbach, Karl H.
Author_Institution :
Dept. of Electr. & Comput. Eng., Old Dominion Univ., Norfolk, VA, USA
fYear :
1999
Firstpage :
248
Abstract :
Summary form only given. Microhollow Cathode discharges are non-equilibrium, high pressure, direct current discharges. By reducing the diameter of the cathode opening in a hollow cathode discharge geometry to values in the sub millimeter range we were able to operate discharges in argon and xenon in a direct current mode up to atmospheric pressure (Scoenbach et al., 1997). We have shown that these discharges are intense sources of xenon and argon excimer radiation peaking at wavelengths of 172 nm and 130 nm, respectively (El-Habachi et al., 1998). Spatially resolved measurements of the excimer source in xenon have been performed. The source was found to be cylindrical along the axis of the electrodes. Its radius increases with current and decreases with pressure. Stacking the discharges, operating them in series, holds the promise for the generation of a laser medium with sufficient length to provide the required threshold gain for a DC excimer laser. Experimental studies of the gain of the plasma column in microhollow cathode discharges are underway.
Keywords :
excimer lasers; glow discharges; laser variables measurement; light sources; plasma diagnostics; 130 nm; 172 nm; Ar; Xe; atmospheric pressure; cathode opening diameter; current effects; cylindrical source radius; direct current mode; discharge stacking; hollow cathode discharge geometry; intense source; laser medium; microhollow cathode discharge excimer light sources; nonequilibrium high pressure direct current discharges; plasma column gain; pressure effects; spatially resolved measurements; sub millimeter range; threshold gain; Argon; Atmospheric measurements; Atmospheric waves; Cathodes; Fault location; Geometry; Light sources; Spatial resolution; Wavelength measurement; Xenon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5224-6
Type :
conf
DOI :
10.1109/PLASMA.1999.829571
Filename :
829571
Link To Document :
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