DocumentCode :
1714678
Title :
High current dc and pulsed field emission from single crystal ZrC[100] emitters mounted in apertures
Author :
Mackie, W.A. ; Tianbao Xie ; Lee, K. ; Davis, P.R.
Author_Institution :
Linfield Res. Inst., McMinnville, OR, USA
fYear :
1999
Firstpage :
263
Abstract :
Summary form only given. We have been working for several years on field emission from transition metal carbides. These studies have covered emission from solid carbide field emitters as well as thin film carbide overcoatings on single tip field emitters and field emitter arrays. These carbide materials have emission properties making them attractive candidates for uses requiring high currents, small spot sizes, and cold cathodes for operation in poor vacuum. Uses might include microwave devices, electron accelerators, free-electron lasers, and other high current applications. We report on field emission studies using [100] oriented ZrC field emitters configured in an extraction or gate aperture. This geometry can allow for efficient confinement and a high brightness beams. Stable high-current emission has been obtained in the 2 mA range dc and pulsed currents as high as 50 mA are demonstrated.
Keywords :
electron field emission; vacuum microelectronics; zirconium compounds; 2 mA; 50 mA; ZrC; electron accelerators; emission properties; extraction aperture; field emitter arrays; field emitters; free-electron lasers; gate aperture; high current DC field emission; high current pulsed field emission; microwave devices; single crystal ZrC[100] emitters; single tip field emitters; thin film carbide overcoatings; transition metal carbides; Cathodes; Crystalline materials; Electron accelerators; Field emitter arrays; Free electron lasers; Masers; Microwave devices; Optical materials; Solids; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-5224-6
Type :
conf
DOI :
10.1109/PLASMA.1999.829597
Filename :
829597
Link To Document :
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