Generation of high density plasma with large volume using pulsed glow discharge

Summary form only given. A new technique, Plasma Source Ion Implantation (PSII) for the surface modification of materials, was proposed by Conrad in 1989. This technique has been studied all over the world as Plasma Based Ion Implantation (PBII), Plasma Immersion Ion Implantation (Pm, PI3), IONCLAD (called by General Motors), PLAD (by Varian). In PBII, it is necessary to generate high density plasma with large volume. Pulsed glow discharge is one of the candidates for the ion source plasma because it can easily generate large volume plasma, although for a short time. This paper describes the characteristics of high current pulsed glow discharge generated using a low impedance circuit. A low inductance capacitor of 1.89 /spl mu/F was used in this experiment.