DocumentCode
1715951
Title
Rise time considerations for photoconductive switch materials used in high power UWB microwave applications
Author
Islam, N.E. ; Schamiloglu, E. ; Fleddermann, C.B. ; Schoenberg, J.S.H. ; Joshi, R.P.
Author_Institution
Dept. of Electr. & Comput. Eng., New Mexico Univ., Albuquerque, NM, USA
fYear
1999
Firstpage
291
Abstract
Summary form only given. Because of its high resistivity undoped semi-insulating (SI) GaAs grown through the liquid encapsulated Czochralski technique has been used as photoconductive semiconductor switches (PCSS) in high power applications. In such cases, the device can withstand an off-state voltage in excess of 20 kV, which can then be transferred to the load during the on state. We present results from the simulation studies of an ´opposed´ contact PCSS, made from EL2/C compensation and compare it with an intrinsic GaAs material. The study presents physical conditions inside the device during the switching operation and looks into the possible effects of low doping verses high resistivity through compensation on the switch rise time. Preliminary results show that the non-compensated (intrinsic) materials behave as ´relaxation´ semiconductors and the recombination mechanism tends to have an adverse effect on the rise time of the device. Effects of bias on the rise time are also investigated.
Keywords
III-V semiconductors; digital simulation; gallium arsenide; photoconducting switches; 20 kV; EL2/C compensation; GaAs; III-V semiconductor; bias effects; high power UWB microwave applications; high resistivity; intrinsic GaAs material; intrinsic materials; liquid encapsulated Czochralski technique; noncompensated materials; off-state voltage; on state; photoconductive semiconductor switches; photoconductive switch materials; recombination mechanism; relaxation semiconductors; rise time; rise time considerations; undoped semi-insulating GaAs; Conductivity; Contacts; Gallium arsenide; Photoconducting devices; Photoconducting materials; Power semiconductor switches; Radiative recombination; Semiconductor device doping; Semiconductor materials; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location
Monterey, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-5224-6
Type
conf
DOI
10.1109/PLASMA.1999.829646
Filename
829646
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