Title :
Dynamic properties of ultra-fast pulsed capillary discharge devices
Author :
Krisch, I. ; Choi, P. ; Dumitrescu, C. ; Engel, A. ; Larour, J. ; Rous, J. ; Juschkin, L. ; Kunze, H.-J.
Author_Institution :
Lab. de Phys. des Milieux Ionises, Ecole Polytech., Palaiseau, France
Abstract :
Summary form only given. We report on a fast pulsed capillary discharge device, which combines the features of transient hollow cathode discharge with the inherent characteristics of the capillary discharge to guarantee radiation in the VUV and soft X-ray region with ns rise time. Various combinations of discharge parameters differing in capacitance of the cell, in the aspect ratio and in the pressure of the filling gas have been studied in order to optimize this table top source to technical and scientific backlighting applications.
Keywords :
X-ray lasers; X-ray production; discharges (electric); plasma devices; VUV radiation; aspect ratio; backlighting applications; capacitance; capillary discharge; discharge parameters; dynamic properties; fast pulsed capillary discharge device; filling gas; soft X-ray radiation; transient hollow cathode discharge; ultra-fast pulsed capillary discharge devices; Argon; Cathodes; Contracts; Fault location; Filling; Plasma applications; Plasma density; Plasma materials processing; Plasma sources; X-rays;
Conference_Titel :
Plasma Science, 1999. ICOPS '99. IEEE Conference Record - Abstracts. 1999 IEEE International Conference on
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5224-6
DOI :
10.1109/PLASMA.1999.829669
