DocumentCode
1716658
Title
Fabrication of 3D nanowire frames by conventional micromachining technology
Author
Sarajlic, E. ; Berenschot, E. ; Krijnen, G. ; Elwenspoek, Miko
Author_Institution
MESA+ Res. Inst., Twente Univ., Enschede, Netherlands
Volume
1
fYear
2005
Firstpage
27
Abstract
We report on a simple parallel processing method capable of producing addressable three-dimensional (3D) nanometer-sized structures, such as wires, wire frames and dots. The method, which is fully compatible with standard micromachining, employs isotropic removal of conformally deposited material onto a prepared template, to form nanostructures in the concave corners of the template. The process results in well-defined nanometer scale structures with exact position and spatial arrangement fully determined by the template. An etching mask with nanometer size features and a nanowire pyramid on a freestanding cantilever have been successfully fabricated, demonstrating the feasibility and potential of this technology.
Keywords
etching; micromachining; nanotechnology; nanowires; 3D nanowire frames; addressable three-dimensional nanometer-sized structures; concave corners; conformally deposited material; conventional micromachining technology; dots; etching mask; fabrication; freestanding cantilever; isotropic removal; nanostructures; parallel processing; prepared template; wire frames; Etching; Fabrication; Micromachining; Nanofabrication; Nanostructured materials; Nanostructures; Parallel processing; Silicon; Surface topography; Wires;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
Print_ISBN
0-7803-8994-8
Type
conf
DOI
10.1109/SENSOR.2005.1496350
Filename
1496350
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