• DocumentCode
    1716781
  • Title

    Boundary conditions for use in plasma simulations

  • Author

    Ordonez, C.A. ; Stephens, K.F. ; Peterkin, R.E.

  • Author_Institution
    Dept. of Phys., North Texas Univ., Denton, TX, USA
  • fYear
    1997
  • Firstpage
    116
  • Abstract
    Summary form only given, as follows. Boundary conditions are presented for use in magnetohydrodynamic, particle-in-cell, and multi-fluid computer programs. The boundary conditions consist of velocity moments for three plasma species near a plasma-facing surface. The three plasma species are plasma ions, plasma electrons and surface emitted electrons. The boundary conditions are developed using a fully kinetic theoretical description of the plasma sheath which takes into account space-charge saturated electron emission from a plasma-facing surface. It is necessary to take into account space-charge saturated electron emission from the plasma-facing surface because of a recent finding which indicates that most of the commonly-used plasma-facing surface materials can reach secondary electron emission coefficients large enough for the emission to be space-charge limited. The boundary conditions are in terms of sheath and presheath potential drops and simple expressions (which are fits to numerical results) are provided for these potential drops.
  • Keywords
    plasma kinetic theory; plasma magnetohydrodynamics; plasma sheaths; plasma simulation; secondary electron emission; space charge; boundary conditions; kinetic theoretical description; magnetohydrodynamic computer program; multi-fluid computer program; particle-in-cell computer program; plasma electrons; plasma ions; plasma sheath; plasma simulations; plasma-facing surface; presheath potential drops; secondary electron emission coefficients; sheath potential drops; space-charge saturated electron emission; surface emitted electrons; velocity moments; Boundary conditions; Computational modeling; Electron emission; Laboratories; Magnetohydrodynamics; Military computing; Physics; Plasma materials processing; Plasma sheaths; Plasma simulation;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3990-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.1997.604353
  • Filename
    604353