DocumentCode
1716873
Title
Simulation tools for the design and analysis of plasma processing equipment
Author
Rauf, Sakandar ; Grapperhaus, M. ; Hoekstra, R.J. ; Kushner, Mark J.
Author_Institution
Illinois Univ., Urbana, IL, USA
fYear
1997
Firstpage
117
Abstract
Summary form only given. Plasma processing equipment has become one of the most important tools used for microelectronics fabrication. The increasing complexity of microelectronics devices is making it imperative to develop a thorough understanding of this equipment. In order to accomplish this goal, a hierarchy of simulation tools have been developed at the University of Illinois in the recent years. These tool are centered around the Hybrid Plasma Equipment Model (HPEM), detailed plasma model. This paper gives an overview of the HPEM, its extensions and the variety of problems these tools can address.
Keywords
integrated circuit manufacture; plasma applications; plasma simulation; semiconductor process modelling; Hybrid Plasma Equipment Model; microelectronics devices; microelectronics fabrication; plasma processing equipment; simulation tools; Analytical models; Computational modeling; Electromagnetic fields; Electrons; Fabrication; Microelectronics; Plasma applications; Plasma devices; Plasma materials processing; Plasma simulation;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location
San Diego, CA, USA
ISSN
0730-9244
Print_ISBN
0-7803-3990-8
Type
conf
DOI
10.1109/PLASMA.1997.604355
Filename
604355
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