Scanning probe parallel nanolithography using multi-probes cantilever array for silicon nanodevices

This research developed two types of multi-probe cantilever arrays for the parallel scanning probe microscope (SPM) based nanolithography (SPNL) with high rates of throughput. The multi-probe cantilever arrays have been fabricated by an anisotropic wet etching process. All probes have a sharp tip of a quasi-trihedral pyramidal shape composed of two (311) and [411] planes. Consequently, we have succeeded in fabrication of parallel nanometric wires and grooves on single crystal silicon (SCS) wafer using negative and positive type of SPNL techniques, respectively. Furthermore, a free suspended silicon nanowire used as a high frequency resonator was developed by the positive SPNL.