Investigation of diagnostic sensors and control models for a compact ion source

Summary form only given, as follows. The diagnostic measurement, modeling, and control of a compact ion/radical source operating at 2.45 GHz microwave frequency is investigated for argon and hydrogen discharges. The investigation of the plasma source includes relating the run-time adjustable inputs, plasma source sensor outputs and process control models. The adjustable inputs include input microwave power, chamber pressure, gas flow rate, and resonant cavity tuning. The plasma source sensor outputs include reflected microwave power, electron temperature, ion density, electron/ion energy distribution and plasma potential. In order to determine the neutral and charged species in the hydrogen discharge, actinometry and OES measurements are used. The process model is the relationship between sensor measurements and input settings or the relationship of output parameters to the input and sensor readings. The sensor measurements combined with analytical and numerical models are used to estimate the plasma source output at various positions.