A self-limited large-displacement-ratio micromechanical amplifier

A micromechanical amplifier, with large-displacement-ratio and self-limited output as a result of the bifurcation effect, is reported. The large output displacement is achieved by amplifying a small input motion through elastic deformation of the compliant configuration, which realizes the self-limited output by the bifurcation effect. The configuration of the compliant microstructures is analyzed with the result of as high as 100 times displacement magnification and self-limitation by the bifurcation effect. Such an amplifier is fabricated by employing the deep reactive ion etching (DRIE) process. It demonstrates a 52.0-μm-output displacement when the input displacement is only 0.96 μm, with a displacement ratio of 54.2. Thereafter, the output displacement remains stable due to the bifurcation effect.