Title :
Test structures for investigation of metal coverage effects on MOSFET matching
Author :
Tuinhout, H.P. ; Vertregt, Maarten
Author_Institution :
Philips Res. Lab., Eindhoven, Netherlands
Abstract :
An extensive set of test structures for characterization of effects of metal coverage on MOSFET matching is presented. These structures prove very useful for evaluation of MOSFET mismatch effects associated with interface states and local mechanical stress differences caused by metal lines running over matched pairs. Better understanding and control of these effects is extremely important for improving advanced mixed signal ICs in modern Multi Level Metal CMOS processes
Keywords :
MOSFET; semiconductor device metallisation; semiconductor device testing; MOSFET matching; interface states; mechanical stress; metal coverage; mismatch; mixed signal IC; multi level metal CMOS process; test structure; Analog circuits; CMOS integrated circuits; CMOS process; Converters; Interface states; MOSFET circuits; Modems; Signal processing; Stress; Testing;
Conference_Titel :
Microelectronic Test Structures, 1997. ICMTS 1997. Proceedings. IEEE International Conference on
Conference_Location :
Monterey, CA
Print_ISBN :
0-7803-3243-1
DOI :
10.1109/ICMTS.1997.589386
