DocumentCode :
1721563
Title :
Two-dimensional drain engineering for leakage reduction in thin-film transistors
Author :
King, Tsu-Jae ; Hack, Michael
Author_Institution :
Xerox Palo Alto Research Center
fYear :
1994
fDate :
6/16/1905 12:00:00 AM
Firstpage :
47
Lastpage :
48
Keywords :
Computer hacking; Current measurement; Doping profiles; Leakage current; Measurement standards; Resilience; Statistical distributions; Thin film transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 1994. 52nd Annual
Type :
conf
DOI :
10.1109/DRC.1994.1009410
Filename :
1009410
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=1721563
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