• DocumentCode
    1722073
  • Title

    Analysis of isotropic and anisotropic etch field emitter array cathodes

  • Author

    True, R.B. ; Good, G.R. ; Hargreaves, Thomas A. ; Palmer, W.D.

  • Author_Institution
    Litton Electron Devices Div., San Carlos, CA, USA
  • fYear
    1997
  • Firstpage
    128
  • Abstract
    Summary form only given, as follows. The paper summarizes computer modelling and numerical results on two field emitter array (FEA) cathode designs manufactured by MCNC. DEMEOS, a deformable triangular mesh finite element gun code, which includes a Fowler-Nordheim model of emission as an option, was used to perform the analysis. This code can include curved dielectrics and irregular shaped tips. Further, the variable mesh feature enables a whole tip and gate structure to be analyzed expeditiously in a single computer run. An isotropically etched tip design was analyzed as well as an anisotropically etched tip design. Experimental and calculated results compare quite well for the isotropic design for which there is much experimental data. It was found and verified experimentally that the isotropic tip has a lower turn-on voltage than the flatter faced anisotropic tip. On the other hand, the beam emerging from the anisotropic tip has significantly lower angular divergence which is important in FEA cathodes contemplated for use in linear beam microwave tubes.
  • Keywords
    arrays; cathodes; electron field emission; mesh generation; microwave tubes; vacuum microelectronics; DEMEOS; Fowler-Nordheim model; angular divergence; anisotropic tip; anisotropically etched tip design; computer modelling; curved dielectrics; deformable triangular mesh finite element gun code; etch field emitter array cathodes; field emitter array cathode designs; gate structure; irregular shaped tips; isotropic tip; isotropically etched tip design; linear beam microwave tubes; numerical results; single computer run; tip structure; variable mesh feature; Anisotropic magnetoresistance; Cathodes; Computer aided manufacturing; Deformable models; Etching; Field emitter arrays; Finite element methods; Numerical models; Pulp manufacturing; Virtual manufacturing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
  • Conference_Location
    San Diego, CA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3990-8
  • Type

    conf

  • DOI
    10.1109/PLASMA.1997.604383
  • Filename
    604383