DocumentCode :
1722073
Title :
Analysis of isotropic and anisotropic etch field emitter array cathodes
Author :
True, R.B. ; Good, G.R. ; Hargreaves, Thomas A. ; Palmer, W.D.
Author_Institution :
Litton Electron Devices Div., San Carlos, CA, USA
fYear :
1997
Firstpage :
128
Abstract :
Summary form only given, as follows. The paper summarizes computer modelling and numerical results on two field emitter array (FEA) cathode designs manufactured by MCNC. DEMEOS, a deformable triangular mesh finite element gun code, which includes a Fowler-Nordheim model of emission as an option, was used to perform the analysis. This code can include curved dielectrics and irregular shaped tips. Further, the variable mesh feature enables a whole tip and gate structure to be analyzed expeditiously in a single computer run. An isotropically etched tip design was analyzed as well as an anisotropically etched tip design. Experimental and calculated results compare quite well for the isotropic design for which there is much experimental data. It was found and verified experimentally that the isotropic tip has a lower turn-on voltage than the flatter faced anisotropic tip. On the other hand, the beam emerging from the anisotropic tip has significantly lower angular divergence which is important in FEA cathodes contemplated for use in linear beam microwave tubes.
Keywords :
arrays; cathodes; electron field emission; mesh generation; microwave tubes; vacuum microelectronics; DEMEOS; Fowler-Nordheim model; angular divergence; anisotropic tip; anisotropically etched tip design; computer modelling; curved dielectrics; deformable triangular mesh finite element gun code; etch field emitter array cathodes; field emitter array cathode designs; gate structure; irregular shaped tips; isotropic tip; isotropically etched tip design; linear beam microwave tubes; numerical results; single computer run; tip structure; variable mesh feature; Anisotropic magnetoresistance; Cathodes; Computer aided manufacturing; Deformable models; Etching; Field emitter arrays; Finite element methods; Numerical models; Pulp manufacturing; Virtual manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1997. IEEE Conference Record - Abstracts., 1997 IEEE International Conference on
Conference_Location :
San Diego, CA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-3990-8
Type :
conf
DOI :
10.1109/PLASMA.1997.604383
Filename :
604383
Link To Document :
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