Title :
Single crystalline silicon micromirror array for peptide synthesis applications
Author :
Jang, Yun-Ho ; Lee, Kook-Nyung ; Shin, Dong-Sik ; Lee, Yoon-Sik ; Kim, Yong-Kweon
Author_Institution :
Samsung Electron. Co., Ltd., South Korea
Abstract :
A single crystalline silicon (SCS) micromirror array (MMA) using a silicon-on-insulator (SOI) wafer and stepper photolithography was developed firstly for peptide synthesis applications. A large mirror size (210 μm) and a separation (60 μm) were optimized for the peptide synthesis application. Smooth surface (RMS roughness <4 nm), flat mirror plate (curvature radius >0.3 m), and uniform voltage characteristics among 256 mirrors (only 2.12 V standard deviation for the average of 96.99 V) were obtained thanks to the SCS and the stepper. Peptide spacers were synthesized with different lengths using the fabricated MMA that was installed in an automatic peptide synthesis system, confirming that the fabricated SCS MMA is a useful tool in peptide synthesis.
Keywords :
micromachining; micromirrors; optimisation; organic compounds; photolithography; silicon; silicon-on-insulator; 210 micron; 60 micron; 96.99 V; SOI wafer; mirror separation optimization; mirror size optimization; peptide spacers; peptide synthesis; silicon-on-insulator wafer; single crystalline silicon micromirror array; stepper photolithography; surface roughness; uniform voltage characteristics; Aluminum; Crystallization; Electrodes; Lithography; Micromirrors; Mirrors; Peptides; Silicon on insulator technology; Springs; Voltage;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
Print_ISBN :
0-7803-8994-8
DOI :
10.1109/SENSOR.2005.1496623