Title :
High-performance micromachined RF planar inductors
Author :
Carazzetti, Patrick ; Dubois, Marc-Alexandre ; De Rooij, Nicolaas-F
Author_Institution :
Inst. of Microtechnol., Neuchatel Univ., Switzerland
Abstract :
High-Q planar spiral inductors were fabricated by innovative micromachining processes based on sputtered Al or electroplated Ag on top of low-loss substrates. 3 μm-thick Al inductors on high-resistivity silicon (HRS) exhibited peak Q-factor of 30 at 5 GHz for corresponding inductance of 2.4 nH. A peak-Q of 70 at 3.8 GHz for 5.5 nH was obtained from a 10 μm-thick Ag device on glass. Measured data were accurately matched using a new equivalent model based on frequency-independent elements. The fabricated inductors are suitable building-blocks for high-performance RF passive circuits, such as low-insertion loss filters and baluns.
Keywords :
Q-factor; equivalent circuits; micromachining; thin film inductors; 10 micron; 3 micron; 3.8 GHz; 5 GHz; Ag; Al; RF passive circuits; baluns; electroplated layers; equivalent circuit model; high-Q planar spiral inductors; low-insertion loss filters; micromachined RF planar inductors; sputtered metal layers; Frequency measurement; Glass; Inductance; Inductors; Micromachining; Passive circuits; Q factor; Radio frequency; Silicon; Spirals;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05. The 13th International Conference on
Print_ISBN :
0-7803-8994-8
DOI :
10.1109/SENSOR.2005.1496644
